Home > Products > Amine Derivatives > > TRIETHYLAMINE HYDROCHLORIDE (TEAHCL)
  • TEAHCL
zoom
  • TEAHCL

TRIETHYLAMINE HYDROCHLORIDE (TEAHCL)

  • Category:
    Amine Derivatives

Your Questions and Comments

Your sales and customer service desk partners within China Amines Co will continue to serve you. You can also contact us via our headquarter office
  • Email:info@chinaamines.com
    China Amines Co

Product Profile

1. Chemical Structure and Properties

Molecular Formula: C₆H₁₆ClN

Structural Formula: (CH₂CH₃)₃N·HCl

A tertiary amine hydrochloride formed by neutralizing triethylamine (TEA) with hydrochloric acid.

Physical Properties:
 Appearance: White crystalline powder or hygroscopic solid.
 Melting Point: 258–262°C (decomposes).
 Solubility: Highly soluble in water (>500 g/L at 25°C), ethanol, and methanol; insoluble in non-polar solvents.
 Odor: Odorless (unlike volatile TEA gas).
 Hygroscopicity: Absorbs moisture rapidly; requires airtight storage.

Chemical Properties:
 Stability: Stable under dry conditions; decomposes upon heating to release TEA gas and HCl.
 Reactivity: Acts as a weak acid (pKa ≈ 10.75); regenerates TEA when treated with strong bases.

2. Industrial Applications

Pharmaceuticals:
 - Intermediate in the synthesis of local anesthetics (e.g., lidocaine) and antihistamines (e.g., tripelennamine).
 - Salt Formation: Enhances solubility and stability of APIs (e.g., epinephrine hydrochloride).

Agrochemicals:
 - Herbicide precursor: Used in atrazine and glyphosate production.
 - Fungicide intermediate: Applied in triazole fungicide synthesis (e.g., tebuconazole).

Organic Synthesis:
 - Catalyst: Promotes alkylation, acylation, and nucleophilic substitution.
 - Surfactant precursor: Forms quaternary ammonium salts used in detergents and softeners.

Electronics:
 - Etching Agent: Removes residues on silicon wafers during semiconductor fabrication (e.g., 3nm node by TSMC).

3. Safety and Toxicology

Health Hazards:
 - Potential liver/kidney toxicity (limited data); not classified as carcinogenic (IARC).
 - Skin/Eye Contact: Causes irritation and burns (rabbit skin LD50 ~800 mg/kg).
 - Inhalation: Dust or decomposition fumes irritate respiratory tract; treat as TEA exposure.
 - Ingestion: Moderately toxic (oral LD50 rat: ~1,800 mg/kg); causes GI tract irritation.

Handling Precautions:
 - PPE: Nitrile gloves, protective goggles, and N95 respirator recommended.
 - Storage: Store in airtight containers under cool, dry conditions; avoid exposure to bases.
 - First Aid: Flush exposed areas thoroughly with water; seek medical attention for serious contact.

4. Environmental and Regulatory Compliance

Environmental Impact:
 - Aquatic Toxicity: LC50 (fish, 96h): 300–600 mg/L; EC50 (daphnia): 150–300 mg/L.
 - Biodegradability: Readily biodegradable (OECD 301D: >70% in 28 days).
 - Persistence: Low due to hydrolysis in aqueous environments.

Regulatory Frameworks:
 - GB 13690-2009 (China): Classified as General Chemical; adhere to standard protocols.
 - OSHA (USA): No established PEL; subject to general dust control requirements.
 - EPA: Listed in TSCA Inventory.
 - CLP (EU): Classified as Skin Irrit. 2 (H315), Eye Irrit. 2 (H319), Acute Tox. 4 (H302).
 - REACH (EU): Fully registered with SDS and disposal requirements.

Transport:
 - UN Number: Not classified as hazardous; may be shipped as non-dangerous goods (non-DG).

5. Case Studies and Application Insights

Case 1: Lidocaine Synthesis
 - Process: TEA HCl reacts with 2,6-xylidine and chloroacetyl chloride to form lidocaine hydrochloride.
 - Efficiency: 90% yield at 60°C using catalytic acid (based on Pfizer's optimized batch process).

Case 2: Semiconductor Wafer Cleaning
 - Application: Samsung employs TEA HCl in advanced lithography steps to remove photoresist residues.
 - Performance: Achieves 99.5% residue purity removal with minimal etching on delicate substrates.

Comparative Analysis:
 - Pros: Non-flammable solid form improves safety and simplifies storage/transport.
 - Cons: Requires base treatment to liberate TEA in reactive synthesis applications.