Tetramethylammonium Hydroxide
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Category:
Amine Derivatives
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Product Profile
1. Chemical Structure and Properties
Molecular Formula: N(CH₃)₄OH
Structural Formula: Tetramethylammonium cation (N⁺(CH₃)₄) with hydroxide anion (OH⁻)
Physical Properties:
Appearance: Colorless to pale yellow liquid (often as 25–25% aqueous solution)
Density: ~1.0 g/cm³ at 20°C
Boiling Point: Decomposes before boiling in concentrated form
Solubility: Completely miscible with water and polar organic solvents
Chemical Properties:
Strong base, highly alkaline
Stable under normal conditions, reactive with acids and oxidizers
Exhibits nucleophilic behavior, useful in organic synthesis
2. Industrial Applications
Semiconductor Industry: Used for anisotropic etching of silicon in microfabrication
Organic Synthesis: Strong base for deprotonation, phase-transfer catalysis, and selective reactions
Surface Treatment: Used in cleaning and preparation of metal surfaces
Analytical Chemistry: Employed in titrations and chromatography as an eluent modifier
3. Safety and Toxicology
Health Hazards:
Skin/Eye Contact: Severe irritation and potential burns
Inhalation: Can cause respiratory irritation and pulmonary edema if mist inhaled
Ingestion: Harmful; may cause gastrointestinal and systemic effects
Fire & Explosion Risk: Non-flammable but reacts violently with acids and oxidizers
Protective Measures:
Wear chemical-resistant gloves, goggles, and protective clothing
Use in well-ventilated areas or fume hoods
In case of contact, rinse immediately with water and seek medical attention
4. Environmental and Regulatory Considerations
Environmental Impact: Highly alkaline; avoid discharge into waterways
Regulatory Compliance:
Listed under various chemical inventories (e.g., TSCA, REACH)
Transport: UN 1814 (TMAH solution), Class 8 corrosive, Packing Group II
5. Case Studies and Application Insights
Semiconductor Etching: Used in KOH-free etching solutions, providing precise microfabrication with minimal defects
Organic Synthesis: TMAH facilitates selective deprotonation in complex molecules, enhancing reaction yield and purity
Comparative Analysis: Compared with potassium hydroxide (KOH), TMAH offers higher solubility in organic solvents and compatibility with sensitive substrates